新型負性光敏聚酰亞胺樹脂的合成與性能研究.pdf

1、武漢理工大學碩士學位論文新型負性光敏聚酰亞胺樹脂的合成與性能研究姓名：黃華波申請學位級別：碩士專業(yè)：材料學指導教師：汪水平20100501武漢理王大學碩士論文AbstractPhotosensitivepolyimides(PSPIs)arehighperformancepolymermaterials，andtheyhaveoutstandingelectricalandmechanicalproperties，excellentth

2、ermalstabilitylowthermalexpansioncoefficient，waterandorganicsolventsresistant，alsocanabsorbtheaparticlesForthatreason，PSPIshavebeenwidelyappliedinthefieldsofmicroelectronics，micromachinerymanufacturing，paintprotection，an

3、dSOonRecentlytheresearchofnegative—workingPSPIsisthehotestspotmorethanothersSofarmostnegativeworkingPSPIsaxethepoly(amicester)andpoly(amieion—linkage)typesfabricatedbythermaltreatment(upto350。C)afterUVcuredSuchthermalimi

4、dizationprocesswouldcausevolumecontractionbecauseofthelossoflowmolecularsubstanceduringthecyclizationprocess，anditwillmakethefilmgenerateinternalstress，evenleadtodeformationanddelamination，thatseriouslyrestrictedtheappli

5、cationsofthesekindsofphotosensitivematerialsTherefore，theresearchanddevelopmentofthePSPIs，withoutpostcuring，hasaveryimportanttheoreticalsignificanceandapplicationvalueThediaminemonomer4，4’diamino4“hydroxytriphenylmethane

6、(DHTM)withapendantphenylhydroxylgroupwasfirstlysynthesizedfrom4hydroxybenzaldehyde，anilineandanilinehydrochlorideAndthen，theresultingDHTMandtheotheronecommercial4，6Diaminoresorcinoldihydrochloride(DAR)reactedwithpyromell

7、iticaciddianhydride(PMDA)and4，4’diaminodiphenylether(ODA)，respectivelytoobtainthehydroxylatepolyimides(PI1andPI2)Finallythemethacrylicacidglycidylester(OMA)WasgraftedontothePIsmainchaintogetthePSPIs(PSPI一1andPSPI2)Theche

8、micalstructureofmonomerandpolymerswereidentifiedbyFTIRspectraand1H—NMR，andthemolecularofPSPIsWasdetectedbythegelpermeationchromatography(GPC)TheresultsshowedthattheDHTMandPSPIshavebeensuccessfullysynthesizedThemolecularw

9、eightofPSPI1andPSPI2are25400and20570，andthepolydispersityindex(Mw／in)is152and171，respectivelyMoreovertheoptimalconditionofthegraetlngreactionwasdeliberated，thebestgraftingreactionconditionsareasfollows，reactiontime：10hou